VACC offers this free compendium of critical vacuum

• Books
• Literature
• Patents

Basic Principles

• Armand Berman, "Total Pressure Measurements in Vacuum Technology", Academic Press, Orlando, FL, 1985
• Gerhard Lewin, "An Elementary Introduction to Vacuum Technique", AVS Monograph Series, American Institute of Physics, Inc. NY, NY, 1987
• J. F. O'Hanlon, "A user's guide to Vacuum Technology", 2nd. Ed. , Wiley, NY, 1989.
• J. H. Leck, "Total and Partial Pressure Measurement in Vacuum Systems", Blackie, Glasgow & London, 1989
• J. M. Lafferty , editor, "Foundations of Vacuum Science and Technology", John Wiley and Sons, Inc., NY, 1998
• J. P. Hobson, "Fifty years of vacuum science", J. Vac. Sci. Technol. A 21, S7 (2003)
• John H. Moore et. al. , "Building Scientific Apparatus: A Practical Guide to Design and Construction, 2nd edition", Addison Wesley, Redwood City, CA, 1989
• M. H. Hablanian, "Major advances in transfer pumps: 1953 - 2003", J. Vac. Sci. Technol. A 21, S15 (2003)
• M. L. Johnson, D. M. Manos, and T. Provost, "Gas permeation and leakage through reusable seals", J. Vac. Sci. Technol. A 15, 763 (1997)
• Marsbed H. Hablanian, "High-Vacuum Technology: A practical Guide", 2nd Edition, Marcel Dekker, Inc. 1997
• Nigel Harris, "Modern Vacuum Practice", McGraw-Hill Publishing Company, 1989
• P. A. Redhead, "Measurement of vacuum; 1950-2003", J. Vac. Sci. Technol. A 21, S1 (2003)
• P. A. Redhead, "Vacuum science and technology: 1950-2003", J. Vac. Sci. Technol. A 21, S12 (2003)
• Phil Danielson, "Building a Vacuum Library", R&D, March 2002, p. 34
• Walter H. Kohl, "Handbook of Materials and Techniques for Vacuum Devices", American Vacuum Society Classics, AIP Press, New York, 1995

Bayard-Alpert Ionization Guages

• Filipelli AS. R., JVST A14(5) (1996) 2953, "Influence of envelope geometry on the sensitivity of "nude" ionization gauges"
• Abbott, P.J. et. al. JVST A12(5) (1994) 2911, "Influence of the filament potential wave form on the sensitivity of glass envelope B-A gauges"
• Albert Filippelli et. al., "Search for pressure dependence in the sensitivity of several common types of hot-cathode ionization gauges for total pressures down to E-7 Pa", J. Vac. Sci. Technol. A9(5) (1991) 2757
• Arnold, P. C. et. al. ,JVST A12(2) (1994) 580, "Stable and reproducible Bayard- Alpert ionization gauge".(Note: The birth of Granville Phillip's Stabil-Ion Gauge)
• B. R. F. Kendall and E. Drubetsky, "Stable Cancellation of x-ray errors in B-A gauges", J. Vac. Sci. Technol A 16(3) (1998) 1163
• B. R. F. Kendall, "Ionization gauge errors at low pressures", J. Vac. Sci. Technol. A17(4) (1999) 2041
• Beeck, U. et. al. , JVST 9 (1971) 126 , "Comparison of the pressure indication of a Bayard-Alpert and an Extractor Gauge"
• Bills, D. G., JVST A12(2) (1994) 574, "Causes of nonstability and nonreproducibility in widely used Bayard-Alpert ionization gauges"
• Charles Morrison, "Safety Hazard from gas discharge interactions with the Bayard-alpert ionization gauge", J. Vac. Sci. Technol. A 3(5) (1985) 2032
• Cox. M. C. et. al., JVST A14(5) (1996) 2963 , "Filament Replacement for nude Bayard Alpert Ionization gauges"
• D. Alpert, Journal of Applied Physics 24 (1953) 860, "New Developments in the production and measurement of UHV". Note: This is the report on the invention of the B-A Gauge
• Edelmann, Chr.; Iwert, Th.; Kauert, R.; Knapp, W., " Some studies of the axial emission ionization gauge according to Chen and Suen", Journal of the Vacuum Society of Japan 37 (1994) 9, 686-69 1
• Edelmann, Chr.; Kauert, R.; Kieler, O.F.O., "On some Improvements of Ionization Gauges of the extractor Type for the Measurement of Extreme High Vacuum", Journal of Vacuum Society of Japan Vol. 39, No. 4 (1996), 149-158
• George Comsa, "Ion Collection in Bayard-Alpert Gauges", J. Vac. Sci. Technol. 9 (1971) 117. Note: Great paper on how it all works inside the gauge
• Gerardo Brucker, "Improvements Coming in Ion Gauge Controllers", R&D Magazine, July 2000, p.41
• Gerardo Brucker, "Which Bayard-Alpert Gauge is best for you?", R&D Magazine, Feb. 2000, p. 69
• H. Akimichi, K. Takeuchi, and Y. Tuzi and I. Arakawa, "Long term behavior of an axial-symmetric transmission gauge", J. Vac. Sci. Technol. A17 (1999) 2021.
• H. Saeki and T. Momose, "Vacuum gauge self-compensating external environment in the Spring-8 storage ring", J. Vac. Sci. Technol. A 18(1) (2000) 244
• Hiroshi Saeki, "Vacuum Gauge system with a self-compensator for photoelectrons produced in the Spring-8 storage ring", J. Vac. Sci. Technol. A 19(1) (2001) 349
• J. H. Singleton, "Practical guide to the use of Bayard-Alpert Ionization Gauges", J. Vac. Sci. Technol. A19(4) (2001)1712
• K. Jousten and P. Rohl, "Instability of the spatial electron current distribution in hot cathode ionization gauges as a source of sensitivity changes", J. Vac. Sci. Technol. A 13(4) (1995) 2266
• Kauert, R.;Kieler, O F O; Biehl, St; Knapp, W, Edelmann, Chr., Wilfert, St. " Numerical investigations of hot cathode ionization gauges", Vacuum 51 (1998) 53
• Kieler, O.F.O.; Biehl, St.; Kauert, R.; Knapp, W., Edelmann, Chr. "Theoretical and experimental desorption investigations at ionization gauges", Vacuum, Vol. 47 (1996), No. 4, 35 1-355
• Miertusova J. , "Reliability and accuracy of total and partial pressure measurements in the UHV pressure range under real experimental conditions" , Vacuum 51 (1998) 61
• N. T. Peacock, "Measurement of x-ray currents in Bayard-Alpert type gauges", J. Vac. Sci. Technol. A 10(4) (1992) 2674
• P. A. Redhead, JVST 6 (1969) 848, "The sensitivity of Bayard-Alpert Gauges"
• P. C. Arnold et. al. "Non-stable behavior of widely used ionization gauges", J. Vac. Sci. Technol. A 12(2) (1994) 568
• P. E. Gear, "The choice of cathode material in a hot cathode ionization gauge", Vacuum 26(1) (1975) 3
• P. H. LaMarche, et. al.,"Neutral Pressure and gas flow instrumentation for TFTR", Rev. Sci. Instrum. 56(5) (1985) 981
• Peacock, R. N. et. al. , JVST A9(3) (1991) 1977, "Comparison of hot cathode and cold cathode ionization gauges"
• Peter Nash, "The use of hot filament ionization gauges", Vacuum 37 (1987) 643
• R&D Magazine, "Gauge Controller Has Many Unexpected Features", August 2000, p. 45
• R. Baptist et. al. ,"Bayard-Alpert vacuum Gauge with microtips" J. Vac. Sci. Technol. B14(3) (1996) 2119
• R. Kauert, S. Wilfert, C. Edelmann, "Bayard-Alpert gauge with additional ion collector for pressure measurements from 10-9-101 mbar", Vacuum 57(3) (2000) 283- 293
• R. N. Peacock and N. T. Peacock, "Sensitivity variation of Bayard-Alpert Gauges with and without closed grids from 10-4 to 1 Pa", J. Vac. Sci. Technol. A(8) (1990) 3341
• Ronald C. Johnson, Randy Tysinger and Paul Arnold, "Pressure Measurement repeatability in high current ion implanters using hot cathode ionization gauge with design and operation optimized for stability", J. Vac. Sci. Technol. A 22(5)(2004) 2191.
• S. D. Woods and C. R. Tilford, "Long-term stability of two types of hot cathode ionization gauges", J. Vac. Sci. Technol. A3 (3) (1985) 542
• Siska, P. E. Rev. Sci. Instrum. 68(4) (1997) 1902, "Partial Rejuvenation of B-A ionization gauge tubes"
• Suginuma S. et. al. , "Dependence of sensitivity coefficient of a nude type Bayard- Alpert Gauge on the diameter of an envelope", Vacuum 53 (1999) 177-180
• T.A. Flaim and P.D. Ownby, J. Vac. Sci. Technol. 8(5) (1971) p 661, "Observations on B-A Ion Gauge Sensitivities To Various Gases"
• Tilford, C. ,JVST A13(2) (1995) 485, "Comments on the stability of Bayard-Alpert ionization Gauges"
• Tilford, C. et. al. , JVST 20 (1982) 1140, "Performance characteristics of a broad range ionization gauge tube"
• Tilford, Charles, JVST A3(3) (1985) 546, "Sensitivity of hot cathode ionization gauges"
• U. Beech and G. Reich, "Comparison of the Pressure Indication of a Bayard-Alpert and an Extractor Gauge", J. Vac. Sci. Technol. 9(1) (1971) 126
• Vic Comello, R&D Magazine, May 1999, p. 57, "Simplify Rough Pumping With a Wide Range Gauge"

Contamination

• Andrew D. Johnson, et.al., "Reducing PFC gas emissions from CVD chamber cleaning", Solid State Technology, December 2000, p. 103
• B. B. Dayton, J. Vac. Sci. Technol. A 13(2) (1995) 451, "Outgassing Rate of preconditioned vacuum systems after a short exposure to the atmosphere: Outgassing rate measurements on Viton-A and copper"
• Bob Langley and Paul LaMarche, "Cleaning of Parts For Use In Vacuum", Vacuum Technology and Coating, August 2001, p.6
• Dave Laube, "Limitations of CO2 cleaning for Semiconductor Process Tools", A2C2 Magazine, February 2001, p. 9
• David Hucknall, "The vagaries of vacuums", Vacuum Solutions, September/October 1999, p. 46
• Donald M. Mattox, "Deposition Chambers and Vacuum-surface "Conditioning"", Vac. Techn. & Coating, Sept. 2002, p. 30
• Donald Mattox, "Cleaning with CO2", Vacuum Technology and Coating, March 2003, p.62
• Donald Mattox, "Water and Water Vapor", Vacuum Technology and Coating, Jan 2001, p. 58
• Fumio Watanabe and Maki Suemitsu, "Separation of ESD neutrals from outgassing originating from the grid surface of emission controlled gauges: Studies with a heated grid gage", J. Vac. Sci. Technol. A 17(6) (1999) 3467
• Greg A. Pfister, "Eliminating Seal Contamination in Semiconductor Process Equipment", Vacuum Technology &Coating, June 2000, p. 29
• Hans H. Funke, Jianlong Yao, and Mark W. Raynora), "Trace moisture emissions from heated metal surfaces in hydrogen service", J. Vac. Sci. Technol. A 22(2) (2004) 437
• Inkuyu Chun, et. al. , J. Vac. Sci. Technol. A 14(4) (1996) 2636, "Outgassing rate characteristic of a stainless steel extreme high vacuum system"
• J. Busath and H.K. Chiu, "Simple Catalytic cell for restoring He leak detector sensitivity on vacuum systems with high D2 backgrounds", J. Vac. Sci. Technol. A 17(4) (1999) 2015
• J. Gomez-Goni and A. G. Mathewson, J. Vac. Sci. Technol. A 15(6) (1997) 3093, "Temperature dependence of the electron induced gas desorption yields on stainless steel, copper and aluminum"
• Jean-Pierre De Luca, "Calibrating a Leak Detector Easily and Accurately", R&D Magazine, April 2000, p. 95
• K. Akaishi, "Solution of the outgassing equation for the pump down of an unbaked vacuum system", J. Vac. Sci. Technol. A17 (1) (1999) 229
• K. L. Holtrop, M. Hansink, and G. Kellman, "Outgassing tests on materials used in the DIII-D magnetic fusion Tokamak", J. Vac. Sci. Technol. A 17(4) (1999) 2064
• L. Layden and D. Wadlow, "High Velocity carbon dioxide snow for cleaning vacuum system surfaces", J. Vac. Sci. Technol. A 8(5) (1990) 3881
• M. Bernardini, et. al., J. Vac. Sci. Technol. A 16(1) (1998) 188, "Air bake-out to reduce hydrogen outgassing from stainless steel"
• Mark Higgins, "High Sensitivity Leak Detection, Done Simply", Vacuum Technology &Coating, January 2001, p. 42
• P. A. Redhead, "Modeling the pump-down of reversibly adsorbed phase I Monolayer and submonolayer initial coverage", JVST A13(2) (1995) 467, and "II. Multilayer Coverage" A 13(6) (1995) 2791
• P. A. Redhead, "Recommended practices for measuring and reporting outgassing data", J. Vac. Sci. Technol. A 29(5)(2002)1667
• Phil Danielson, "Backstreaming Traps", Vacuum & Thin Film, August 199, p. 8
• Phil Danielson, "Contamination Lurks in Vacuum Systems, Sources", R&D Magazine, May 2001, p. 45
• Phil Danielson, "Desorbing Water in Vacuum Systems: Bakeout or UV?", R&D Magazine, January 2001, p. 57
• Phil Danielson, "Fight Humidity in your vacuum system", R&D Magazine, June 2001, p. 67
• Phil Danielson, "Reduce Water Vapor in Vacuum Systems", R&D Magazine, September 2000, S-10
• Phil Danielson, "Using Simple Tools to Avoid Vacuum Performance Problems", R&D Magazine, Dec 2001, p. 61
• Phil Danielson, Vacuum & Thin Film Magazine, April 1999, p. 12, "Reducing Water Vapor, Problems with Dry Gas"
• Phil Danielson, Vacuum and Thin Film, January 1999, p. 14, " Gas Loads from elastomer seals"
• Rita Mohanty, "Use of Getters in Hermetic Packages", Vacuum Technology and Coating, October 2000, p. 41
• Vic Comello, R&D Magazine, December 1998, p. 43, " Oil a Concern with Rotary Vane Pumps"
• Vic Comello, R&D Magazine, July 1999, p. 24,"Controlling Downstream Contamination Can Be Profitable"
• Vic Comello, R&D Magazine, March 1993, p. 57, "Cleansing your quadrupole, Cryopumps Enhance Low-Level Contamination Detection"
• Vincent Nemanic, et. al., J. Vac. Sci. and Technol. A17(3) (1999) 1040, "Outgassing in Thin Wall Stainless Steel Cells"
• Y. Saito, et. al., "Outgassing measurements of stacked laminations for use as electromagnet core", J. Vac. Sci. Technol. A 22(5)(2004) 2206

High Pressure Sampling

• Batey J. H. Vacuum 44 (5-7) (1993) 639, "Fractionation in gas inlets for PPA calibration"
• Felix Shapirov, "Rarefied gas flow through a long rectangular channel", J. Vac. Sci. Technol. A 17(5) (1999) 3062
• Gilbert R. Smith and Robert R. Gidner, Semiconductor International, "Innovative Gas Handling Technology", June 1997, p. 125
• Haripov F., J. Vac. Sci. Technol. A 15(4) (1997) 2434, "Rarefied gas flow through a long tube at arbitrary pressure and temperature drops"
• I. E. Sodal and D. A. Hanna, "Improved mass spectrometer measurements using a pulsed gas sampling system", J. Vac. Sci. Technol. A 15(1) (1997) 176.
• Seksan Dheandhanoo, et. al., "Atmospheric Pressure Sample Inlet for Mass Spectrometers", Rev. Sci. Instr.7 1 (2000) 4655
• Toshio Takiya, Fumio Higashino, Y. Terada, and A. Komura, "Pressure Wave propagation by gas expansion in a high vacuum tube", J. Vac. Sci. Technol. A 17(4) (1999) 2059

Membrane Introduction MS (MIMS)

• Colin S. Creaser, David Gomez Lamarca, Jeffrey Brum, Christopher Werner, Anthony P. New and Luisa M. Freitas dos Santos, "Reversed-Phase Membrane Inlet Mass Spectrometry Applied to the Real-Time Monitoring of Low Molecular Weight Alcohols in Chloroform", Anal. Chem. 74(2002) 300-304
• R. T. Short et. al. , "Underwater Mass Spectrometers for in situ Chemical analysis of the Hydrosphere", J. Am. Soc. Mass Spectrom. 12 (2001) 676
• Raimo Ketola, et. al., "Environmental applications of MIMS", Journal of Mass Spectrometry 37 (2002) 457

Pirani and Thermocouple Guages

• E. Zakar et. al. , "Process and fabrication of lead zirconate titanate thin film pressure sensor", J. Vac. Sci. Technol. A 19(1) (2001) 345
• Heijne,L. et. al. , Philips Technical Review, 30(1969) 166, "A Pirani Gauge for pressures up to 1000 Torr and higher"
• J. English et. al. J. Sci. Instrum. 42 (1965) 77, "A wide Range constant resistance Pirani Gauge with ambient temperature compensation"
• K. F. Poulter et. al. , J. Vac. Sci. and Technol. 17(2) (1980) 638, "Reproducibility of the performance of Pirani Gauges"
• Phil Danielson, "The Ins and Outs of Thermal Conductivity Pressure Gauges", R&D Magazine, Oct. 2004, p. 36
• S. N. Wang, "Thermal Micropressure sensor for pressure monitoring in a minute package", J. Vac. Sci. Technol. A 19(1) (2001) 353
• Suman Chatterjee, et. al. , "A Vacuum gauge using positive temperature coefficient thermistor as the sensor", Rev. Sci. Instr., 71(2000) 4670
• T. M. Berlicki, "Heat Dissipation in thin-film vacuum sensor", J. Vac. Sci. Technol. A 19(1) (2001) 325
• Vic Comello, "When to Choose a Thermocouple Gauge", R&D Magazine, May 2000, p. 75

Pumps

• "Alloys Update Getter Pumps", R&D Magazine, November 2000
• "Finding a pump just got easier", R&D Magazine, Feb. 2000. Note: table describing and comparing the pumps from 40 different suppliers
• A. D. Chew, et. al., "Considerations for Primary Vacuum Pumping in Mass Spectrometry Systems", Spectroscopy 20(1) (2005) 44
• A. Liepert and and P. Lessard, "Design and operation of scroll-type dry primary vacuum pumps", J. Vac. Sci. Technol. A19(4) (2001) 1708
• Atul Patil, "Improving High Vacuum Pumping Performance Using a Cryogenic Water Pump Backed by a Turbomolecular Pump", July 2000, Vacuum Technology & Coating, p. 40
• Baliga J., Semiconductor International, October 1997, p. 86, "Vacuum Pump Designs Adjust to Harsher Conditions"
• Bob Langley and Paul LaMarche, "Criteria for Selection of Pumping Fluids for Diffusion Pumps and of Vacuum Greases", Vacuun Technology and Coating, December 2004, p. 20
• Bob Langley et. al., "Picking the right pump and the Sizing and matching of Pumps", Vacuum Technology and Coating, May 2002, p.23
• C. G. Masi, "Instrumentation Needs Drive Turbopump Development", R&D Magazine, Oct 2001, p. 16
• Dale Morton, "The effects of Pumping Speed on the Operation of a Cold Cathode Ion Source", Vacuum Technology and Coating, June 2001, p. 36
• Donald Mattox, "Cryopumps, Sorption Pumps and Cryopanels", Vacuum Technology & Coating, Jan 2005, p. 36
• Donald Mattox, "Mechanical Vacuum Pumps", Vacuum Technology &Coating, April 2001, p. 53
• Donald Mattox, "Oil Diffusion Pumps", Vacuum Technology and Coating, July 2001. P.26
• Donald Mattox, "Turbomolecular Vacuum Pumps", Vacuum Technology and Coating, Jan 2003, p.24 Eckhard Bez, Solid State Technology, March 1999, p. S3, " Advances in Oil Free Vacuum Pumps"
• Eckhard Bez, VACUUM and THINFILM, June 1999, p. 30 , "Oil Sealed Vacuum Pumps. Reducing Energy Consumption"
• Gary Ash, "Cryogenic High Vacuum Pumps: An overview of their application and use", Vacuum&ThinFilm, August 1999, p. 20
• Heinz Barfus, et.al. , "Moving Dry Pumps From the Subfab Floor To the Tool", R&D Magazine, September 2000, S18
• I. Akutsu and T. Ohmi, "Innovation of thr fore pump and roughing pump for high-gas-flow semiconductor processing", J. Vac. Sci. Technol. A 17(6) (1999) 3505
• J. J. Manura, "Vacuum Pump Exhaust Filters. Part I: A Two Stage Vacuum Pump Exhaust Filter System", The Mass Spec Source , Summer 2000, p. 4
• John Freeman, "Cost Down and performance up!", Inside Vacuum, Pfeiffer's Customer Magazine, no. 5. Winter 2000. p. 9
• Jurgen Breitenbach, "The Influence of Diaphragm Pumps on the Hydrogen Partial Pressure in High Vacuum Systems", Vacuum Technology and Coating, Jan. 2003, p.38
• Kimo H. Welch, J. Vac. Sci. Technol. A12(4) (1994) 915, "Some important developments in capture pumping technology in the last 40 years"
• Kimo M. Welch, "Titanium Sublimation Pump Sources", Vacuum Technology & Coating, January 2005, p. 28
• Kimo Welch, "A century of Capture Pumping Technology- Sputter-Ion pumping", Vacuum Technology and Coating, June 2004, p. 18
• Kimo Welch, "Closed-Loop Gaseous Helium Cryopumps", Vacuum Technology and Coating, Spetember 2000, p. 8
• Kimo Welch, "The Cryopump Placebo Effect", Vacuum Technology and Coating, September 2000, p. 10
• Kimo Welch, "Titanium Sublimation Pumps How They Work", Vac. Technology & Coating, Dec 2004, p. 32
• M. H. Hablanian, "The Hybrid High Vacuum Turbopump", Vacuum Technology and Coating, Sept 2000, p. 40
• M. H. Hablanian, J. Vac. Sci. Technol. A12(4) (1994) 897, "Throughput type pumps and ultrahigh vacuum"
• P.D. Vibert, "Troubleshooting Vacuum Pumping Systems", Vacuum Technology and Coating, July 2001, p. 55
• Peter M. Yau and Atul N. Patil, "Chemical Scroll Pumps Are Ideal for Lab Applications", R&D Magazine, June 2000, p. 80
• Phil Danielson, "Careful Consideration Means getting the right pump", R&D Magazine, April 2001, p. 29
• Phil Danielson, "Cryopump Crossover", Vacuum&ThinFilm, November 1999, p. 8
• Phil Danielson, "Diaphragm Pump Designs Determine Results", R&D Magazine, November 2000
• Phil Danielson, "How to Match Pumping Speed to Gas Load", R&D Magazine, December 2000, p. 30
• Phil Danielson, "Making the Oil-Sealed vs. Oil Free Decision", R&D Magazine, July 2001, p. 66
• Phil Danielson, "Matching Cryopumping Techniques to Applications", R&D Magazine, Oct. 2003, p. 36
• Phil Danielson, "Matching Vacuum Pump to process", R&D Magazine, November 2001, p. 53
• Phil Danielson, "Water Vapor Pumping Produces Unique Problems", R&D Magazine Feb 2002, p.59
• Phil Danielson, VACUUM and THINFILM, July 1999, p. 8, "Backstreaming from Oil-sealed Pumps"
• Philip Lessard, "Dry Vacuum pumps for semiconductor processes: Guidelines for primary pump selection" , JVST A 18(4) (2000) 1777
• Phillip A. Lessard, "Vacuum Pumping Systems for Chemical Vapor Deposition Tools", Vacuum Technology & Coating, June 2000, p. 34
• R&D Magazine, February 1995, p. 55, "Dry Mechanical Vacuum Pumps For Almost Any Application"
• R. P. Davis et. al. "Dry Vacuum pumps: A method for the evaluation of the degree of dry", JVST A 18(4) (2000) 1782
• Robert Langley, "Turbomolecular Pumps", Vac. Technology & Coating, February 2005, p. 32
• Roberto Giannantonio, et. al. , R&D Magazine, February 1998, p. 83, "Better Getters Help Vacuum Pumps Work Faster"
• Ron Hawranko, "How to Choose a TurboPump", R&D Magazine, July 2003, p. 46
• S. Nesterov, J. Vasiliev, L.C.Wagner and M. Boiarski, "Hydrogen Pumping simulation for cryopumps", J. Vac. Sci. Technol. A 17(4) (1999) 2099
• Steven Chambreau, et. al. , "Low cost, mechanically refrigerated diffusion pump baffle for ultrahigh vacuum chambers", J. Vac. Sci. Technol. A 18(5) (2000) 2581
• Terrence Thompson, "High-Vacuum Pumps", Vacuum Technology and Coating, Dec 2002, p.52
• Terrence Thompson, "Roughing Pumps, Dry and Oil Filled", Vacuum Technology and Coating, November 2002, p. 42
• Vic Comello, "High Speed Screw Pumps Being Developed for 300-mm Wafers", R&D Magazine, May 2000, p. 73
• Vic Comello, "Ion Pumps Provide Clean UHV Environments", R&D Magazine, July 2000, p. 45
• Vic Comello, "Roots Pumps are Versatile Performers", R&D Magazine, Back to Basics, June 2000, p. 93
• Vic Comello, "Tailoring Traps to Specific applications", R&D Magazine, January 2000, p. 59
• Vic Comello, R&D Magazine, February 1998, p. 81, " Exhausting Process Gases Safely and Efficiently"
• Vic Comello, R&D Magazine, February 1999, p. 63, " Choosing a Diaphragm Pump for a Turbo"
• Vic Comello, R&D Magazine, June 1998, p. 79, "Why Hybrid Turbos Are Often Preferred"
• Vic Comello, R&D Magazine, October 1996, p. 41, "Turbodrag Pumps Offer Improved Throughput and Light Gas Compression"
• Vic. Comello, "Turbos Designed for Harsh Environments", R&D Magazine, March 2000, p. 45
• Youfan Gu, "Managing TEOS Effluents", R&D Magazine, Feb. 2000, p. 67

Quantitative RGA Measurements

• Andrew K. Ottens, W.W. Harrison, Timothy P. Griffin, and William Helms, "Real time Quantitative Analysis of H2, He, O2 and Ar by Quadrupole Ion Trap Mass Spectrometry", JASMS 13(2002) 1120
• B. R. F. Kendall, "Pulsed Gas injection for on-line calibration of residual gas analyzers", J. Vac. Sci. Technol. A 5(1)(1987) 143
• Bley, Vacuum, 38 (1988) 103-109: "Quantitative measurements with quadrupole mass spectrometers: important specifications for reliable measurements"
• Cowen, et. al., J. Vac. Sci. Technol. A 12(1), Jan/Feb 1994: " Non-linearities in sensitivity of quadrupole partial pressure analyzers operating at higher pressures"
• Kimo Welch, "Calibrating Partial Pressure Gauges. A learning experience", Vacuum Technology and Coating, Nov/Dec 2000, p. 40
• L. J. Kieffer, et. al., Reviews of Modern Physics, 38(1) (19966) 1, "Electron Impact Ionization cross-section Data for Atoms, Atomic Ions, and Diatomic Molecules: I. Experimental Data"
• NIST Database: Electron Impact Ionization Cross Sections, Y-K. Kim , et. al. , on-line version: http://physics.nist.gov/PhysRefData/Ionization/Xsection.html
• P. J. Abbott et. al. JVST A14(3) (1996) 1242 , "Commercial helium permeation leak standards: Their properties and reliability"
• R. A. Ketola, et. al., Rapid Comm. Mass Spectrom. 13 (1999) 654-662, "A Non- Linear Asymmetric Error Function based Least Mean Square Approach for the Analysis of Multicomponent Mass Spectra Measured by Membrane Inlet Mass Spectrometry"

Residual Gas Analysis

• Anne B. Giordani et. al., "What is Mass Spectrometry?", 1998, a supplement to the Journal of the American Society of Mass Spectrometry
• Austin et. al., Vacuum 41(1990)2001, "Optimization of the operation of the small quadrupole mass spectrometer to give minimum long-term instability"
• B. Wilamowski, et.al., "Enhancing the sensitivity of miniutarized mass spectrometers", IECON'01, 27th Annual Conference of the IEEE Industrial Electronics Society, p. 147
• Basford et. al., J. Vac. Sci. Technol. A 11(3) (1993) A22-40: "Recommended Practice for the Calibration of Mass Spectrometers for Partial Pressure Analysis. Update to AVS Standard 2.3"
• Batey, Vacuum, 37 (1987) 659-668:" Quadrupole Gas Analyzers"
• Bob Langley and Paul LaMarche, "Analyzing Spectrometer Hydrocarbon Spectra", Vac. Technology and Coating, Oct. 2003, p. 22
• Bob Langley and Paul LaMarche, "Mass Spectrometer Basics and Operation", Vacuum Technology and Coating, Oct. 2002. P. 20
• Changkung Dong and G. Rao Myneni, "Field emitter based extractor gauges and residual gas analyzers", J. Vac. Sci. Technol. A17(4) (1999) 2026.
• Dawson, "Quadrupole Mass Spectrometry and Its Applications", AIP Press, NY, 1995
• Dawson, Mass Spectrometry Reviews, 5 (1986) 1-37: "Quadrupole mass analyzers: Performance, design, and some recent applications"
• Drinkwine and D. Lichtman, "Partial Pressure Analyzers and Analysis", AVS Monograph Series published by the Education Committee of the American Vacuum Society
• E. Lanzinger, et. al., "Partial Pressure Measurement by means of infrared laser absorption spectroscopy", Vacuum 51 (1998) 47-5 1
• Ethan Badman, R. Graham Cooks, "Miniature Mass Analyzers", J. Mass Spectrom. 35 (2000)659
• Fu Ming Mao et. al., Vacuum, 37 (1987) 669-675: " The quadrupole mass spectrometer in practical operation"
• Gerardo A. Brucker, "How to use an RGA", R&D Magazine, June 2001, p. 13
• J. H. Batey, "Thermal Desorption from mass spectrometer filaments", Vacuum 43(1) (1992) 15
• J. R. Gibson and Stephen Taylor, "Prediction of quadrupole mass filter performance for hyperbolic and circular cross section electrodes", Rapid Communications in Mass Spectrometry, 14 (2000) 1669
• J. R. Gibson, S. Taylor and J. H. Leck, "Detailed simulation of mass spectra for quadrupole mass spectrometer systems", J. Vac. Sci. Technol. A 18(1) (2000) 237
• M. G. Rao and C. Dong, J. Vac. Sci. Technol. A 15(3) (1997) 1312, "Evaluation of low cost residual gas analyzers for ultrahigh vacuum applications". Note: The RGA models in this paper are: A: MKS PPT 050EM, B: SRS 100 AMU with electron multiplier, C: MKS PPT 200EM, D: Balzers QMS 200 M, E: Leybold Inficon High performance Transpectorr H100M as indicated by the authors
• Ma'an H. Amad and R. S. Houk, "Mass resolution of 11,000 to 22,000 with a multiple pass Quadrupole mass analyzer", J. Am. Soc. Mass Spectrom. 11 (2000) 407
• N. Ogiwara, K. Suganuma , Y. Miyo , S. Kobayashi and Y. Saito, "Application of the field emitter array to the vacuum measurements", Applied Surface Science, 146( 1999)234-238. Note: A Spindt emitter array is interfaced to an RGA
• Phil Danielson, "Will RGAs Replace Ion Gauges?", R&D Magazine, June2003,p. 31 S. Boumsellek and R. J. Ferran, "Trade Offs in Miniature Quadrupole Designs", J. Am. Soc. Mass Spectrom. 12 (2001) 633. Note: A complete article describing the inherent advantages and limitations of small quadrupole designs
• S. Daolio, et. al., "Quadrupole Secondary Ion Mass Spectrometer for Simultaneous Detection of Positive and Negative Ions", Rapid. Commun. Mass Spectrom. 13 (1999) 782-785
• S. Taylor et.al., "A miniature mass spectrometer for chemical and biological sensing", Proc. SPIE 4036 (2000) 187
• Sharon Lewis, "Simplifying the Residual Gas Analyzer", R&D Magazine, October 2000, p. 21.
• Shue Watanabe, Hitoshi Oyama, Shigeki Kato and Masakazu Aono, "Measurement of partial pressures in extremely high vacuum region using a modified residual gas analyzer", Rev. Sci. Instr. 70 (1999) 1880
• T. E. Felter, "Cold cathode emitter array on a quadrupole mass spectrometer: Route to miniaturization", J. Vac. Sci. Technol. B 17(5), Sept/Oct 1999, p. 1993
• Vladimir I. Baranov, "Analytical Approach for Description of Ion Motion in QMS", J. Am. Soc. Mass Spectrom. 14 (2003) 818
• Vladimir I. Baranov, "Analytical approach for description of Ion Motion in Quadrupole Mass Spectrometer", J. Am. Soc. Mass Spectrom. 14 (2003) 818-82

RGA Applications

• A. G. Chakhovskoi, C. E. Hunt, M.E. Malinowski, "Gas Desorption electron stimulated during operation of field emitter-phosphor screen pairs", Displays, 19 (1999) 179-184
• Babu Chalamala, Robert Wallace and Bruce Gnade, "Poisoning of Spindt-type molybdenum field emitter arrays by CO2", J. Vac. Sci. Technol. B 16(5) (1998) 2866
• Babu R. Chalamala, David Uebelhoer and Kenneth A. Dean, "Apparatus for quantitative analysis of residual gases in flat panel vacuum packages", J. Vac. Sci. Technol. A 18(2) (2000) 1
• Brian Dickson, et. al., "Vacuum-based Process Toll Diagnostics: How to expose trends and problems that the tolls themselves cannot detect", Vacuum and ThinFilm, August 1999, p.30
• C. B. Yarling "History of Industrial and commercial ion implantation: 1906-1978", JVST A 18 (4) (2000) 1746.
• C. D'Couto and Sanjay Tripathi, Semiconductor International, July 1996, p. 343, "Residual Gas Analysis Suggests Process Improvement"
• C. R. Cole, R. A. Outlaw, "Mass Spectral Resolution of F+ and H3O+ in very high vacuum", J. Vac. Sci. Technol. A 21(5) (2003) 1796.
• C. Richard Arkin, et. al., "Evaluation of Small Mass Spectrometer Systems for Permanent Gas Analysis", J. Am. Soc. Mass Spec. 13 (2002) 1004
• Charles C. Allgood, "Impact and behavior of trace contaminants in high purity plasma process gases", Solid State Technology, Sept. 1999, p. 63
• Colin S. Creaser, David Gomez Lamarca, Jeffrey Brum, Christopher Werner, Anthony P. New and Luisa M. Freitasdos Santos, "Reversed-Phase Membrane Inlet Mass Spectrometry Applied to the Real-Time Monitoring of Low Molecular Weight Alcohols in Chloroform", Anal. Chem. 74(2002) 300-304
• D. R. Ermer, et. al. "Intensity Dependence of Cation Kinetic Energies from 2,5- dihydroxybenzoic acid near the infrared matrix-assisted laser desorption/ionization threshold", Journal of Mass Spectrometry, 36 (2001)
• Don Hall, Wells Shentwu, S. Michael Sterner, and Paul D. Wagner, 1997, "Using Fluid Inclusions to Explore for Oil and Gas", Hart's Petroleum Engineer International, No. 11, p. 29-34
• Donald M. Mattox, "Applications of Vacuum Coating", Vacuum Technology and Coating, May 2001, p. 16
• Gerardo A. Brucker, "What Else Can a RGA Do?, Vacuum Technology and Coating, July 2003, p. 36
• Guangquan Lu, Laura L. Tedder and Gary W. Rubloff, "Process sensing and metrology in gate oxide growth by rapid thermal chemical vapor deposition from SiH4 and N2O", J. Vac. Sci. Technol. B17(4) (1999) 1417
• H. G. Buhrer, et.al., "Investigating the curing of amino resins with TGA-MS and TGA-FTIR", UserCom, 2/200 1, p. 13. ; Cyril Darribere, "TGA-FTIR and TGA-MS measurements", UserCom, 2/2001, p. 21
• Hadley, Scott W., Don L. Hall, S. Michael Sterner, and Wells Shentwu, 1997, "Hydrocarbon Pay Delineation and Product Characterization with Fluid Inclusions: Examples from East Coast Canada and Western Canada Sedimentary Basin", in Can. Well Log. Soc. in site, Vol. 1, No. 3, p.2-4
• Harmeet Singh, et. al. "Mass spectrometric detection of reactive neutral species: Beam-to-background ratio", J. Vac. Sci. Technol. A17(5) (1999) 2447
• Harmeet Singh, J. W. Coburn and David B. Graves, "Appearance potential mass spectrometry: Discrimination of Dissociative ionization products", J. Vac. Sci. Technol. A18(2) (2000) 299
• J. Wang and U. Burghaus, "Adsorption dynamics of CO2 on Zn-ZnO(0001): A molecular beam study" J. Chem Phys. 122 (2005)044705.
• Jim Snow, Stuart Tison and Walter Plante, "Evolving gas flow, measurement, and control technologies", Solid State Technology, October 1999, p. 51.
• Jorge Diaz, Clayton Giese and W. R. Gentry, "Mass Spectrometry for in-situ volcanic gas monitoring", trends in analytical chemistry, vol. 21, no. 8, 2002
• K. C. Lin, "Continuous Gas Monitoring Reduces Losses", Semiconductor International, May 1999
• L.L. Tedder, et. al., J. Vac. Sci. Technol. B, 13(4) (1995) 1924, "Real-time process and product diagnostics in rapid thermal chemical vapor deposition using in situ mass spectrometry sampling"
• Lakeman, Semiconductor International. October 1995, p. 127: "Increase overall Equipment Effectiveness with In Situ Mass Spectrometry"
• Marcus B. Wise, Michael R. Guerin, "Direct Sampling Mass Spectrometry", Anal. Chem., News and Features, Jan 1, 1997, p. 26A
• Mark W.Raynor, et. al., "On-line Impurity Detection in Corrosive Gases Using Quadrupole Mass Spectrometry", LEOS Newsletter, October 2000, page 9
• N. Takahashi et. al., "Development of the quadrupole mass spectrometer with the Bessel-Box type energy analyzer: Function of the energy analyzer in the partial pressure measurements", J. Vac. Sci. Technol. A 19(4) (2001) 1688
• O. David Sparkman, "The 12th Sanibel Conference on Mass Spectrometry: Field- Portable and Miniature Mass Spectrometry", J. Am. Soc. Mass Spectrom. 11 (2000) 468
• O'Hanlon, J. Vac. Sci. Technol. A 12 (4), Jul/Aug 1994: "Ultrahigh vacuum in the semiconductor industry"
• P. Ausloos et. al., "The Critical Evaluation of a Comprehensive Mass Spectral Library", J. Am. Soc. Mass Spec., 10 (1999) 287-299.
• Paul Espitalier-Noel, "Integrate gas, chemical, vacuum, and exhaust design", Solid State Technology, Oct. 1999, p. 65
• Paul LaMarche and Bob Langley, "Dial V for Vacuum", Vacuum Technology and Coating, March 2003, p. 1
• Peter Rosenthal, "Gas Analysis Solutions for Yield Improvement of Deposition Processes for LEDs and Large Area Coatings Applications", Vacuum Technology and Coating, July 2003, p. 26. Note: It includes FTIR and Micropole Technology
• R. T. Short et. al. , "Underwater Mass Spectrometers for in situ Chemical analysis of the Hydrosphere", J. Am. Soc. Mass Spectrom. 12 (2001) 676
• R. W. Rosenberg, Semiconductor International, October 1995, p. 149, "The Advantages of Continuous On-line RGA Monitoring"
• Robert K. Waits, "Monitoring residual and process gases in PVD processes: The importance of sensitivity", MICRO Magazine, June 1997, p. 81
• Robert Waits, "Evolution of integrated-circuit vacuum processes: 1959-1975", JVST A 18(4) (2000) 1736
• Robert Waits, "Semiconductor and thin film applications of a quadrupole mass spectrometer", J. Vac. Sci. Technol. A 17(4) (1999) 1469
• Rosenberg, Semiconductor International, October 1995, p. 149: "The Advantages of Continuous On-line RGA Monitoring"
• Russ Carr, "Sensor Automates Detection of Photoresist Residues", R&D Magazine, March 2000, p. 51
• Scott A. Furman et. al., "Improving the detection limit of a quadrupole mass spectrometer", J. Vac. Sci. Technol. A 19(3) (20001) 1032
• Semiconductor International Magazine, October 1995, p. 70, " Researchers Demonstrate Viability of QMS for In Situ Diagnostics"
• Several Authors, Filed Emission Arrays, J. Vac. Sci. Technol. B, Vol 21, No. 4, July/Aug 2003
• Steve Whitten, et. al., "Investigating an integrated approach to etch emissions management", MICRO, March 2002, p. 83
• Surajed Promreuk, "Achieving process understanding and real-time fault detection on a PVD toll", MICRO Magazine, March 2002, p. 45
• T. P. Schneider et. al., "Real-time in situ residual gas monitorring", FUTURE FAB International, issue 4, volume 1, p.237
• Thomas P. Scneider et. al. , "Using partial pressure analysis to monitor wet clean recovery", System Design
• Tom Basalik, "TGA with Evolved Gas Analysis", American Laboratory, 37, Jan 2005, p. 24.
• V. A. Shamamian et. al. "Mass Aspectrometric Characterization of Pulsed plasmas for deposition of thin polyethylene Glycol-like Polymer films", Vacuum Technology and Coating, September 2002, p. 40.
• Vic Comello, "RGAs Provide Real Time Process Control", Semiconductor International, September 1990.
• Vic Comello, "Using RGAs for Process Monitoring", R&D Magazine, October 1997, p. 33. ("Back to Basics" article)
• Vic Comello, R&D Magazine, September 1993, p. 65: "Process Monitoring with "Smart" RGAs"
• Waits, et. al., Semiconductor International, May 1994, p. 79: " Controlling your Vacuum Process: Effective Use of a QMA"
• Xi Li et. al., "Mass Spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive Ions, Radicals, and Endpoint Detection", J. Vac. Sci. Technol. A17(5) (1999) 2438
• Xi Li. Et. al.,"Mass Spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection", J. Vac. Sci. Technol. A 17(5) (1999) 2438
• Xi Li. Et. al.,"Specially resolved mass spectrometric sampling of ICPs using a movable sampling orifice", J. Vac. Sci. Technol. A21(6) (2003)1971

System Design

• A. Noble and M. Kasevich, "UHV optical window seal to conflat knife edge" Rev. Sci. Instrum. 65(9) (1994) 3042
• Adam M. Hawkridge et. al. "Cryogenic ultrahigh vacuum manipulator for angle dependent x-ray photelectron spectroscopy studies", J. Vac. Sci. Technol. A 18(2) (2000)567
• Amara Rozgus, "Vacuum Users Think Outside the Box", R&D Magazine, Oct. 2002, p. 26
• Bob Langley and Paul LaMarche, "O-Rings: Materials - Part 1", Vac. Technology and Coating, June 2004, p. 24
• Boude C. Moore, "Thin-walled chambers of austenitic steel", J. Vac. Sci. Technol. A 19(1) (2001) 228
• C. Biscardi, et. al. "Application of Porcelain Enamel as an UHV-compatible electrical insulator", JVST A 18(4) (2000) 1751
• D. L. Miller et. al. , "All metal ultrahigh vacuum optical fiber feedthru", J. Vac. Sci. Technol. A 19(1) (2001) 386
• Dan Goodman et. al., "Etch and CVD process improvements via heated vacuum throttle valves", Solid State Technology, December 2000, p. 80
• Denise M. McClenathan, et. al., "Directly Digital Flow Controller", Anal. Chem. 77(3) (2005) 948. Note: A digital flow controller based on the GasDAC concept offers fast resonse, linear response and adjustable range. Check out figure 3 for a schematic of the electronic circuit used to control the solenoid valves
• Donald M. Mattox, "Safety Aspects of Vacuum Processing", Vacuum Technology &Coating, January 2005, p. 32
• Donald Mattox, "Deposition Chambers and Vacuum-surface "Conditioning"", Vac. Technology &Coating, February 2005, p.26
• Donald Mattox, "Safety Aspects of Vacuum Processing", Vacuum Technology and Coating, March 2001, p. 22
• Donald Mattox, "Steady State and Transient Conductance", Vacuum Technology and Coating, June 2001, p. 20
• E.V.Alonso, et.al. ,"Low Cost, Simple Gate Valve", Rev. Sci. Instr. 66 (3) (1995) 2738
• Gerald Murphy and Kathryn Whitenack, "Chilled Water Options Vary for Laboratory Equipment", R&D Magazine, May 2000, p. 55
• Gerardo Brucker, "Prevention is Key to Vacuum System Safety", R&D Magazine, Feb. 2001, p.57
• Gerhard Lewin, "An elementary introduction to vacuum technique", AVS Monograph Series published by the Education Committee of the American Vacuum Society
• Glen Tisdale et. al., Solid State Technology, May 1998, "Next Generation Aluminum Vacuum Systems"
• H.F. Dylla et. al., "Design and installation of a low particulate, ultrahigh vacuum system for a high power free-electron laser, J. Vac. Sci. Technol. A 17(4) (1999) 2113
• Hugh Everson, "From Scrap Metal to Vacuum Components", Vacuum Solutions March/April 1999
• Ian Stevenson et. al., "Choosing a Chamber, Varouos Functions to Consider", Vacuum & Thin Film, Sept. 1999, p. 23
• J. M. Lafferty, "Foundations of Vacuum Science and Technology", John Wiley &Sons, New York, 1997
• John Baxter, "Gas Delivery Systems Undergo Radical Design Modifcations", R&D Magazine, Oct. 2001, p. 36
• John T. Yates, "Experimental Innovations in Surface Science. A guide to Practical Laboratory Methods and Instruments", Springer-Verlag, New York, 1997
• Kaveh H. Zarkar, et. al. "Designing High-Performance Vacuum Control Systems", R&D Magazine, Sept 2000, S-3
• Kimo M. Welch, "Finger Ponting in the FAB", Vacuum Technology and Coating, May 2000, p. 12-16
• Kimo Welch, "All-Metal Vacuum Seals", Vacuum Technology and Coating, May 2001, p. 6; also "More on all-metal seals", Vacuum Technology and Coating, June 2001, p. 12
• Kimo Welch, "Variants of the Long Tube Formula", Vac. Tech and Coating, February 2005, p. 22
• Lawrence Lamont Jr., "Thin Film PVD and strategies for optimized UHV-XHV pumping", Solid State Teghnology, July 2001, p. 81
• M. Lenzen and R.E. Collins, "Hermetic indium metal-to-glass tube seal", J. Vac. Sci. Technol A18(2) (2000) 552
• M. Mapes. "Summary of Quick Disconnect vacuum flanges", J. Vac. Sci. Technol. A19(4) (2001) 1693
• M. McKeown, "What you should know about traps, valves and gauges", Semiconductor International, March 1991, p. 109
• Mike Ackeret, "Manipulators in a Vacuum: The challenge of manipulating samples in a controlled, ultra-clean or vacuum environment", Vacuum & Thin Film, Sept. 1999, p. 31
• Norbert Pocheim, "Throttle Valve Reduces Cost of Ownership", R&D Mag. Feb. 2000, p. 65.
• P. LaMarche and Bob Langley, "Vacuum Vessel Fabrication", Vacuum technology and Coating, Jan 2003, p. 26
• P. R. McCabe and A. L. Utz, "Low cost alternative to motorized linear and rotary motion feedthroughs", J. Vac. Sci. Technol. A 17(6) (1999) 3529
• P. R. McCabe et. al., J. Vac. Sci. and Technol., A 17 (2) (1999) 673, "A convenient means of securing gaskets during assembly of vertically oriented knife-edge flanges"
• Patrick Carlucci and David Durkin, "Selecting Regulators for Specialty Gases: Understanding and configuration software simplify the task", Gases and technology, July/August 2004, p. 43
• Paul LaMarche and Bob Langley, "Gas Admission Systems", Vacuum Technology and Coating, July 2003, p. 18
• Paul LaMarchend Bob Langley, "Movement in Vacuum", Vacuum Technology and coating, Nov. 2002, p. 26.Note: Information on vacuum compatible actuated devices
• Peter Geng et. al. , "A compact UHV system for the in-situ investigation of III/V
semiconductor surfaces", Rev. Sci. Instr. 71(2) (2000) 504
• Phil Danielson, "Advances in Vacuum Sealing", Vacuum & Thin Film, Sept. 1999, p. 8
• Phil Danielson, "Anatomy of a PumpDown", R&D Magazine, June 2004, p. 33
• Phil Danielson, "Assessing Gas Loads in Vacuum System Design", R&D Magazine, Oct. 2000, p. 39
• Phil Danielson, "How to Use the Q= S P Vacuum Relationship", R&D Magazine, March 2001, p. 33
• Phil Danielson, "Improve your vacuum system performance and behavior", R&D Magazine, August 2000, p.39
• Phil Danielson, "Molecular Flux Provides Process Understanding", R&D Mag., August 2001, p.65
• Phil Danielson, "Sealing Materials Require a Careful Choice", R&D Magazine, August 2004, p. 29
• Phil Danielson, "Solving Process Problems at the Molecular Flux Level", R&D Magazine August 2003, p. 31
• Phil Danielson, "The Flavor Issue-How to Choose the Right Vacuum Materials", R&D Magazine, April 2003, p. 39-40
• Phil Danielson, "The Vacuum Chamber-Volume or Surface Area?, Vacuum&ThinFilm, October 1999, p. 8
• Phil Danielson, "Vacuum Envelope Penetration", R&D Magazine, September 2001, p. 82
• Phil Danielson, Vacuum & ThinFilm, March 1999, "Gas Load and Effective Pumping Speed", p. 12, and "Creating a Vacuum", p. 34
• Phil Danielson, Vacuum & ThinFilm, Nov/Dec. 1998, "Rate-of -rise Measurements", p. 12
• Phil Danielson, Vacuum & ThinFilm, Oct. 1998, "Gas Loads in Vacuum Systems", p. 37, and "The Value of PumpDown Curves", p. 12
• Phil Danielson, Vacuum and Thin Film, July 1999, p. 18, " Why Create a Vacuum? How physical and chemical factors affect molecular activity"
• Phil Danielson, Vacuum and Thin Film, June 1999, p. 12, " Gas Loads from Virtual Leaks"
• Phil Danielson, Vacuum and Thin Film, May 1999, p. 10, " Gas Flow Rates: Volume Flow and Mass Flow"
• Philip Lessard, "Vacuum Issues in the semiconductor Industry, Ion Implantation", Vacuum Technology and Coating, June 2003, p. 36
• Ping Li, "Dynamic Sealing Using "Ferrofluidic", Vacuum Technology and Coating, Novmber 2001, p. 32
• R. Moreh and Y. Finkelstein, "A practical all-metal flange-seal for high and low temperatures", Rev. Sci. Instr. 71(2) (2000) 591
• Ray Dubois and James Mayer, "Safety Solutions for High Pressure Gas Cylinders", Solid State Technology, July 2001, p. 153
• Rich Combs, "New RF Feedthrus Minimize Coupling Effects", R&D Magazine, March 2000, p. 47.
• S. G. Lee and J. G. Bak, "A vacuum chamber with a radial rotating port", Rev. Sci. Instr. 70 (1999) 4437
• S. Kurokouchi, "Influence of lubricating conditions of fixing bolts on penetration of Conflat flange knife edge into gasket", J. Vac. Sci. Technol. A18(1) (2000) 288
• S. Kurokouchi, et. al., "Characteristics of a Taper seal type gasket for the Conflat Sealing System", J. Vac. Sci. Technol., A 19(6) (2001) 2963
• Stan Kassela, "Improving fab productivity with predictive vacuum maintenance", Solid State Technology, Feb 2003, p.77
• Studt, R&D Magazine, October 1991, p. 104: "Design Away Those Tough Vacuum System Riddles"
• V. S. Smentkowski and A. L.Linsebigler, " Stabilization of long travel-single bellows-horizontal manipulators", J. Vac. Sci. Technol. A17(4) (1999) 2056
• Vic Comello, "Do's and Don'ts of Designing UHV Chambers", R&D Magazine, October 1999, p. 18
• Vic Comello, "Metal-Sealed Components Are Not Just for UHV Anymore", R&D Magazine, October 1997, p. 24
• Vic Comello, "Taking Vacuum Valves Seriously", R&D Magazine, March 1998, p. 61
• Vic Comello, "Viewport Shutter Designs Meet Deposition Requirements", R&D Mag. June 2000, p. 87
• Vincenc Nemanic et. al. "Experiments with a thin walled stainless steel vacuum chamber", JVST A 18(4) (2000) 1789
• W. F. Smith , B. G. Stokes and J. F. Crawford, "Cryogenic substrate cooling or substrate heating without vacuum feedthrus", J. Vac. Sci. Technol. A 18(1) (2000) 290
• William Wuertz, "Welding system Improves Quality Assurance", R&D Magazine, March 2000, p. 26
• Y. Suetsugu, et. al. "Development of an all-metal vacuum bellows following twist motion", J. Vac. Sci. Technol. A 17(6) (1999) 3500
• Z. Celinski , "Molecular Beam epitaxy system at an undergraduate institution", J. Vac. Sci. Technol. A 19(1) (2001) 383

Spinning Rotor, Vacuum Standard

• J. K. Fremerey, J. Vac. Sci. Technol. A3 (3) (1985) 1715, "The Spinning Rotor Gauge"
• J. P. Looney et. al. "PC Based spinning rotor gage controller", Rev. Sci. Instr. 65(9) (1994) 3012
• J. Setina, "Two Point calibration scheme for the linearization of the spinning rotor gauge at transition regime pressures", J. Vac. Sci. Technol. A 17(4) (1999) 2086
• James Basford et. al. "Recommended practice for the calibration of Mass spectrometers for partial pressure analysis", J. Vac. Sci. Technol. A 11(3) (1993) A22
• K. E. McCulloh et. al. "Low-range flow-meters for use with vacuum and leak standards", J. Vac. Sci. Technol. A5(3) (1987) 376
• K. E. McCulloh et. al. "Summary Abstract: The national Bureau of standards orifice- flow primary high vacuum standard", J. Vac. Sci. Technol. A4(3) (1986) 362
• K. Jousten, A.R. Filippelli, C.R. Tilford, and F. J. Redgrave, "Comparison of the standards for high and ultrahigh vacuum at three national standards laboratories", J. Vac. Sci. Technol. A 15 (4) (1997) 2395
• Kimo M. Welch, "A Poor-Man's Traceable High Vacuum Gauge Calibration System", Vacuum Technology and Coating, Nov/Dec 2000, p. 8
• Kimo Welch, "Verifying a Leak Checker's Sensitivity to 10-12 TorrL/s (He)", Vacuum Technology &Coating, April 2001, p.12
• L. D. Hinkle, J. Provost, and D. J. Surette, "Primary pressure standard for calibration in the medium vacuum range", J. Vac. Sci. Technol. A 15, 2802 (1997)
• P. D. Levine et. al. "Development of a primary standard UHV calibration station", J. Vac. Sci. Technol. A 12(4) (1994) 1727
• P. D. Levine et. al. "Precision gas flowmeter for Vacuum calibration", J. Vac. Sci. Technol. A 15(3) (1997) 747
• P. D. Levine et. al. JVST A14(3) (1996) 1297, "A primary high vacuum calibration station for industrial applications"
• P. Mohan "Vacuum Gauge calibration at the NPL (India) using orifice flow method" Vacuum 5 1(1998) 69
• R. E. Ellefson, A. P. Miller, "Recommended practice for calibrating vacuum gauges of the thermal conductivity type", J. Vac. Sci. Technol. A 18(5) (2000) 2568-2577
• S. P. Hansen, " Vacuum Instrument Calibration & Personnel Training Boost Productivity", Vacuum Technology &Coating, April 2001, p. 46 Sharrill Dittmann et. al. , "The Molecular drag gThermal Desorption
• Sharrill Dittmann et. al. , "The Molecular drag gauge as a calibration Standard", J. Vac. Sci. Technol. A7(6) (1989) 3356
• Sharrill Dittmann, "High Vacuum Standard and its use", NIST Special Publication 250-34. U.S. Department of Commerce , National Institute of Standards and Technology
• Tilford, C. et. al. , JVST A6(5) (1988) 2853, "The National Bureau of Standards primary high-vacuum standard"
• W. Steckelmacher, Vacuum 37 (1987) 651, "The Calibration of Vacuum Gauges"

Thermal Desorption

• A. M. de Jong et. al. "Thermal Desorption Analysis: Comparative test of ten commonly applied procedures", Surface Science 233 (1990) 355
• Babu R. Chalamala, David Uebelhoer and Robert H. Reuss, "Apparatus for temperature programmed desorption studies of thin films", Rev. Sci. Instr. 71 (2000) 320
• C. G. Wiegenstein et. al. , "A virtual approach for automation of temperature programmed desorption", Rev. Sci. Instrum., 69(10) (1998) 3707
• D. Schleussner, et. al. "Temperature Programmed Desorption from Graphite", J. Vac. Sci. Technol. A17(5) (1999) 2785
• Herbert J. Tobias and Paul J. Ziemann, "Compound Identification in Organic Aerosols Using TPD Particle Beam Mass Spectrometry", Anal Chem. 71 (1999) 3428-3435
• J. Gunster et. al., "Mg clusters on MgO surfaces: Characterization with metastable impact electron spectroscopy, ultraviolet photoelectron spectroscopy and temperature programmed desorption, A 17(4) (1999) 1657
• J. L. Gland, et. al. J. Phys. Chem. 100 (1996) 11389, "Temperature Programmed Desorption Spectra of Systems with Concentration Gradients in the Solid Lattice"
• J. L. Gland, et. al. Surface Science 355 (1996) L385, "The effects of exposure time and pressure on the TPD spectra of systems with bulk states"
• J. T. Yates, Jr. et. al. , Surface Science 322 (1995) 243, "CO adsorption on stepped Pd (112): studies by thermal and electron stimulated desorption"
• J. T. Yates, Jr., "Design and construction of a semiautomatic temperature programmed desorption apparatus for ultrahigh vacuum", J. Vac. Sci. Technol. A 23(1) (2005) 215. J
• . T. Yates, Methods in Experimental Physics, vol. 22 , Academic Press Orlando 1985, p. 425
• J. W. Niemantsverdriet et. al. "The compensation effect in thermal desorption of adsorbate systems with lateral interactions", J. Vac. Sci. Technol. A 6 (3) (1998) 757
• J. W. Niemantsverdriet et. al., "Thermal desorption of strained monoatomic Ag and Au layers from Ru(001)", J. Vac. Sci. Technol. A 5(4) (1987) 875
• John T. Yates, "Experimental Innovations in Surface Science. A guide to Practical Laboratory Methods and Instruments", Springer-Verlag, New York, 1997
• K. W. Bryant et. al. , "Versatile and economic specimen heater for ultrahigh vacuum applications", J. Vac. Sci. Technol. A17(5) (1999) 3057
• L. D. Hinkle, "Effect of purge pressure on desorbing water removal rate" J. Vac. Sci. Technol. A 22, 1799 (2004)
• Li Chen and Jeff Kelber, "Polymerized C-Si films on metal substrates: Cu adhesion/diffusion barriers for ultralarge scale integration?, J. Vac. Sci. Technol. A17(4) (1999) 1968
• M. J. Weiss, C. J. Hagedorn, and W. H. Weinberg, "Observation of gas-phase atomic oxygen with Ru(001)-p(1x1)-D at 80K, J. Vac. Sci. Technol. A 16(6) (1998) 3521
• P.A. Redhead, Vacuum, 12 (1962) 203, "Thermal Desorption of Gases". Note: A "Classic" paper with the basics
• R. M. Hardeveld et. al. "The adsorption of NH3 on Rh(111)", Surface Science 369(1996) 23-35
• R. M. Hardeveld et. al."Kinetics of elementary surface reactions studied by static secondary ion mass spectrometry and temperature programmed reaction spectroscopy", J. Mol. Catalysis A: Chem 131 (1998) 199-208
• St. J. Dixon-Warren, et. al. "Butanethiol on Au{ 100}-(5X20) using a simple retractable doser", J. Vac. Sci. Technol. A17(5) (1999) 2982
• St. J. Dixon-Warren, N. Burson, V. Bondzie, L. Zhang, Y. Yu, L. Lucchesi, "A Simple Single Crystal SampleTemperature Controller Based on Commercial Components for UHV Surface Science Application", Rev. Sci. Instr., 69 (1998) 3006
• Sung-Il Cho, "TPD Study on the decomposition mechanismof Ti(OC3H7)4 on Si(100)", J. Electrochem. Soc. 148(9) (2001) C599
• Tyler Watt and Nicholas Materer, "Temperature programmer for surface science studies with application to semiconductor surfaces", J. Vac. Sci. Technol. A20(2) (2002) 572
• V. A. Bondzie, S. C. Parker and C. T. Campbell, "Oxygen Adsorption on well defined gold particles on TiO2 (110), J. Vac. Sci. Technol. A 17 (4) (1999) 1717

Total Pressure Measurement

• B. R. F. Kendall and E. Drubetsky, "Compact wide range cold cathode gauges", JVST A18(4) (2000) 1724
• B. R. Kendall et. al. , J. Vac. Sci. Technol. A15(3) (1997) 740, "Cold Cathode Gauges for ultrahigh vacuum measurements"
• C. P. Grudzien and D. J. Lischer, "New Enhanced Performance low pressure Capacitance Manometer", JVST A 18(4) (2000) 1730
• Dick Jacobs, Vacuum&ThinFilm, February 1999, p. 30, "Advances in Capacitance Manometers for Pressure Measurement"
• Donald Mattox, "Vacuum Gauges for the Plasma Environment", Vacuum Technology and Coating, June 2003, p. 26
• Donald Mattox, "Vacuum Gauging", Vacuum Technology & Coating, February 2003, p. 26
• Emil Drubetsky and Richard Glazewski, "Vacuum Measuremeents using Modern Cold Cathode Technology", Vacuum Technology and Coating, Oct 2002, p. 54
• Eric Bopp, "Pressure measurement in ion implanters", Solid State Technology, Feb. 2000, p. 51. Note: Includes a comparison between cold and hot cathode gauge performance in ion implant applications
• Fiona Redgrave, "How to choose a vacuum gauge", Vacuum Solutions, November/December 2000, p.50
• Hiroshi Saeki, et. al. "Pressure Measurement errors in cold cathode ionization gauge caused by an external electron source", J. Vac. Sci. Technol. A22(5) (2004) 2212
• J. H. Leck, "Total and Partial Pressure Measurement in Vacuum Systems", edited by Blackie and Son Limited, 1989, Glasgow and London
• James Lee, " The future of Web-Enabled Vacuum Instrumentation", R&D Magazine, Oct. 2000, p. 29
• John Sullivan, "Advances in Vacuum Measurement Almost Mette Past Projections", R&D Magazine, August 1995, p. 31
• P. A. Redhead, Vacuum 44 (1993) 559, "UHV and XHV Pressure Measurement"
• P.A. Redhead, J. Vac. Sci. Technol. A12(4) (1994) 904, "History of Ultrahigh Vacuum Pressure Measurements"
• Peter Singer, "Trends in Vacuum Gauging", Semiconductor International, March 1992, p. 78
• Stephen Hansen and Kathryn Whitenack, "Pressure measurement and control in loadlocks", Solid State Technology, October 1997, p. 151
• Stephen P. Hansen, Vacuum and Thin Film, May 1999, p. 24, "Vacuum Pressure Measurement"
• Tilford, C., JVST A1(2) (1983) 152, "Reliability of high vacuum measurements"
• Tim Studt, " Reliability, Cost and Size Demands Dominate New Gauge Designs", R&D Magazine, Vacuum Technology Section, May 1996, p. 54
• W. A. Levinson, Semiconductor International, Oct. 1995, p. 165, "How Good is your gauge?"

Vacuum Technology Publications

• AVS Monograph Series. The American Vacuum Society publishes a whole series of monographs on vacuum technology and processing
• Review of Scientific Instruments. A monthly journal from the American Institute of Physics (www.aip.org) devoted to scientific instruments, apparatus and techniques
• Semiconductor International. Monthly Cahners publication dedicated to semiconductor processing subjects. Available on the web: www.semiconductor.net
• Solid State Technology. A monthly PennWell publication, available on-line: www.solid-state.com
• The Journal of Vacuum Science & Technology A. Vacuum, Surfaces and Films. Published six times annually by the American Vacuum Society
• The Journal of Vacuum Science & Technology B. Microelectronics and Nanometer Structures. Published six times annually by the American Vacuum Society
• Vacuum. The international journal Vacuum publishes high quality papers on latest advances in the many areas requiring pressures below one atmosphere. Published by Pergamon Press, a division of Elsevier Books and Journals

Variable Leak Valves

• R. A. Langley et.al. , "A calibrated Variable Leak for use in ion Source Operation", JVST A19 (2001) 673
• R. A. Langley, et.al., "Gas injection system for the Advanced Toroidal Facility", JVST A7 (1989) 2423
• Robert A. Langley and Paul LaMarche, "Variable Valves/Leaks", Vacuum Technology & Coating, April 2003, p.24